Extreme Ultraviolet (EUV) Lithography Market expected to grow at a CAGR of 28.16 percent by 2023

 

Extreme Ultraviolet Lithography (EUVL) Systems Market Outlook - 2023

Extreme ultraviolet lithography is a more advanced form of lithography that employs ultra violet light with the shortest wavelength of 13.5 nm. Lithography is primarily used to print complex patterns on semiconductor wafers, most of which are highlight integrated circuits.


One of the factors driving the growth of the global extreme ultraviolet (EUV) lithography market is the increasing use of smartphones around the world. The technology of extreme ultraviolet lithography is used in the production of compact electronics chips. These small chips are used to store memory in smartphones and other products. As a result, the growing number of smartphone users around the world is expected to fuel the market growth during the forecast period. According to the Australian Communications and Media Authority's Communications Report (2018–19), in June 2019, 83 percent (approximately 16.4 million) of Australian adults owned a smartphone.

The EUV lithography market (EUVL) is expected to grow at a CAGR of 28.16 percent from USD 1.24 billion in 2017 to USD 10.31 billion by 2023.

Extreme UV lithography is a next-generation lithography technology that uses the shortest wavelength to create circuits with small features and obtain a higher-resolution output. Lithography is a technique for printing complex patterns on semiconductor wafers that define integrated circuits. EUV lithography (EUVL) is a leading next generation lithography (NGL)  technologies. The most common technologies for producing high power EUV radiation are discharge-produced plasma (DPP) and laser-produced plasma (LPP).

We can get compact electronic chips with lower power requirements by using EUVL. The technology has a higher resolving power and is less expensive. As a result, the global extreme ultraviolet lithography (EUVL) systems market is expected to grow moderately in the coming years. However, market growth is expected to be hampered by limited acceptance and the risk of unknown technical flaws. Furthermore, due to the successful implementation of EUVL, projection lithography is expected to remain the semiconductor industry's pattern technology of choice for many years to come.

Competition Analysis

This report includes a comprehensive competitive analysis as well as profiles of major market players such as ASML, Canon Inc., Intel Corporation, Nikon Corporation, NuFlare Technology Inc., Samsung Corporation, SUSS Microtec AG, Taiwan Semiconductor Manufacturing Company Limited (TSMC), Ultratech Inc., and Vistec Semiconductor Systems.

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